What Is the Ideal EBL Charge Dissipation Rate for Your Process?
Electron-beam lithography (EBL) is a powerful technique in microfabrication, essential for creating extremely precise patterns on various substrates. Unlike conventional photolithography, which relies on light, EBL uses a focused beam of electrons to draw custom patterns with nanometer precision. This capability makes it invaluable for developing advanced semiconductors, MEMS (Micro-Electro-Mechanical Systems), and other nanoscale devices. However, one of the challenges associated with EBL is managing charge accumulation on insulating substrates, which can lead to pattern distortion and reduced accuracy.
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