E-Beam Lithography: Precision in Microfabrication
Electron-beam lithography (e-beam lithography) stands out as a critical technique in the field of microfabrication. This method employs a focused beam of electrons to create intricate patterns on a substrate, crucial for producing high-resolution features in semiconductor devices, microelectromechanical systems (MEMS), and nanostructures. Unlike traditional photolithography, which uses ultraviolet light, e-beam lithography offers much finer resolution, making it ideal for applications where precision is paramount.
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