EBL Charge Dissipation Rate: The Key to Precision Patterning
Electron Beam Lithography (EBL) is a powerful tool for creating incredibly tiny and intricate patterns. It's like using a finely tuned pencil to draw on a microscopic canvas. But this delicate process is easily disrupted by a pesky problem: charge buildup. As the electron beam interacts with the substrate, it can leave behind a static charge. If not managed correctly, this charge can distort the electron beam, leading to inaccurate and unreliable patterns.
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